| ATOMIC-RESOLUTION OF THE SILICON (111)-(7X7) SURFACE BY ATOMIC-FORCE MICROSCOPY |
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| Author(s): GIESSIBL FJ |
| Source: SCIENCE Volume: 267 Issue: 5194 Pages: 68-71 Published: JAN 6 1995 |
| Times Cited: 541 References: 15 |
| Abstract: Achieving high resolution under ultrahigh-vacuum conditions with the force microscope can be difficult for reactive surfaces, where the interaction forces between the tip and the samples can be relatively large. A force detection scheme that makes use of a modified cantilever beam and senses the force gradient through frequency modulation is described. The reconstructed silicon (111)-(7x7) surface was imaged in a noncontact mode by force microscopy with atomic resolution (6 angstroms lateral, 0.1 angstrom vertical). |
| Document Type: Article |
| Language: English |
| Reprint Address: GIESSIBL, FJ (reprint author), PK SCI INSTRUMENTS, 1171 BORREGAS AVE, SUNNYVALE, CA 94089 USA |
| Publisher: AMER ASSOC ADVAN SCIENCE, 1333 H ST NW, WASHINGTON, DC 20005 |
| Subject Category: Multidisciplinary Sciences |
| IDS Number: QA235 |
| ISSN: 0036-8075 |